Micro mirror arrays and microstructures with solderable connection sites

ABSTRACT

A micro mirror array including an upper wafer portion having a plurality of movable reflective surfaces located thereon, the upper wafer portion defining a coverage area in top view. The array further includes a lower wafer portion located generally below and coupled to the upper wafer portion. The lower wafer portion includes at least one connection site located thereon, the at least one connection site being electrically or operatively coupled to at least one component which can control the movement of at least one of the reflective surfaces. The at least one connection site is not generally located within the coverage area of the upper wafer portion.

BACKGROUND

The present invention is directed to a microstructure system or a mirrorarray, and more particularly, in one embodiment to an array ofindividually movable mirrors for use in an optical cross connect engine.

In fiber optic communication systems a plurality of optical fibers areused to transmit light signals in a well-known manner. In order to routethe light signals to the desired destination, fiber optic communicationsystems may include a plurality of optical cross connect enginesdispersed throughout the system. The optical cross connect engines mayfunction as “junction boxes” to route the light signals between variousoptical fibers in the desired manner. The optical cross connect enginescan include a plurality of mirrors and optical tools to route lightsignals between the various optical fibers. The mirror arrays typicallyare or include micro electro mechanical systems (“MEMS”) formed by MEMSprocessing methods.

Most existing mirror arrays require electrodes and a relatively complexsystem of control electronics electrically coupled to the electrodes tocontrol and coordinate the voltages that are applied to the electrodes,which in turn controls movement of the mirrors. In many existing opticalcross connect engine MEMS systems, the control electronics may belocated on a first wafer, wafer portion or die and the components to becontrolled may be located on a second wafer, wafer portion or die. Thefirst wafer can then be located adjacent to the second wafer, andconnections between the first and second wafer can be completed via wirebonds so that the control electronics can control the components to becontrolled. However, in this case, the control electronics must becoupled to the electrodes by a large number of wire bond connections,and is therefore time consuming and expensive to assemble. In addition,the parasitic effects of the large number of wire bonds can reduce theeffectiveness of the device.

SUMMARY

In one embodiment, the present invention is a micro mirror array whichincludes an upper wafer, wafer portion or die and a lower wafer, waferportion or die and a set of connection sites located on the lower dieand outside of the coverage area of the upper die which can enable easyaccess to the connection site. In particular, in one embodiment theinvention is a micro mirror array including an upper wafer portionhaving a plurality of movable reflective surfaces located thereon, theupper wafer portion defining a coverage area in top view. The arrayfurther includes a lower wafer portion located generally below andcoupled to the upper wafer portion. The lower wafer portion includes atleast one connection site located thereon, the at least one connectionsite being electrically or operatively coupled to at least one componentwhich can control the movement of at least one of the reflectivesurfaces. The at least one connection site is not generally locatedwithin the coverage area of the upper wafer portion.

In another embodiment, the invention is a microstructure having asolderable surface. In particular, in one embodiment the invention is amicrostructure system including a wafer portion including amicrostructure formed therein, located thereon or supported thereby. Themicrostructure system also includes a solderable surface configured toreceive an electronic component thereon in a direct attachment manner,the solderable surface being formed on, located on, or supported by thewafer portion. The solderable surface is electrically or operativelycoupled to the microstructure such that an electronic component coupledto solderable surface can control, operate or receive inputs from atleast part of the microstructure.

In another embodiment, the invention is a microstructure systemincluding an upper wafer or wafer portion including a microstructureformed therein, located thereon or supported thereby, the upper waferportion defining a coverage area in top view. The system furtherincludes a lower wafer or wafer portion located generally below andcoupled to the upper wafer or wafer portion. The lower wafer or waferportion includes an electronic component located thereon or supportedthereby, the electronic component being electrically or operativelycoupled to the microstructure such that the electronic component cancontrol, operate or receive inputs from at least part of themicrostructure. The electronic component is generally not located withinthe coverage area of the upper wafer portion.

In yet another embodiment, the invention includes the use of an adhesiveor photopatternable material to join wafers or portions of amicrostructure together, or to electrically isolate portions of a waferor microstructure.

Other objects and advantages of the present invention will be apparentfrom the following description and the accompanying drawings.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 is a schematic representation of an optical cross connect engine;

FIG. 2 is a top plan view of one embodiment of the mirror array of thepresent invention;

FIG. 3 is a detail view of a portion of the mirror array of FIG. 2;

FIG. 4 is a top view of selected upper components of the mirror array ofFIG. 3;

FIG. 5 is a perspective exploded view of the portion of the mirror arrayof FIG. 3;

FIG. 6 is a representative cross section taken along line 6-6 of FIG. 3;

FIG. 7 is a representative cross section taken along line 7-7 of FIG. 3;

FIG. 8 is a schematic representation of a mirror of one embodiment ofthe mirror array of the present invention, illustrated in variousrotational positions;

FIGS. 9-11 are a series of side cross sections illustrating a series ofsteps that may be used to form/singulate a mirror array;

FIGS. 12-14 are a series of side cross sections illustrating a series ofsteps for coupling wafers together; and

FIGS. 15-19 are a series of side cross sections illustrating a series ofsteps for depositing a passivation layer and bonding wafer portions.

DETAILED DESCRIPTION

As shown in FIG. 1, the mirror array of the present invention, generallydesignated 10, can be used with or as part of an optical cross connectengine, such as a photonic or optical cross connection engine (“POXCE”),generally designated 12. A plurality of fiber optic cables 14 (only oneof which is shown in FIG. 1) may be coupled to the optical cross connectengine 12. Each fiber optic cable 14 may include a plurality ofindividual optical fibers 16 encased therein. Each optical fiber 16 maycarry or transport a light signal or beam 18.

In one embodiment, each beam 18 from each optical fiber 16 that iscoupled to the optical cross connect engine 12 may be passed through alens 20 that focuses each beam 18 upon a diffraction grating lens system22. The grating lens system 22 can separate each beam 18 into aplurality of wavelength channel beams 19. Each wavelength channel beam19 can represent a discreet wavelength that carries a signal, and eachbeam 18 and fiber 16 can typically carry a large number of discretewavelength channel beams or signals, for example, up to 160 or moresignals. The dispersed wavelength channel beams 19 may then be passedthrough a lens 24 and a quarter-wave plate 26 to compensate for thepolarization sensitivity of the grating. However, the POXCE may utilizevarious methods and means for routing signals and beams, and need notnecessarily include wavelength switching or other methods/componentsdescribed above.

The wavelength channel beams 19 may then. reach the mirror array 10,also known as a micromechanical switching matrix. The mirror array 10may include a plurality of movable mirrors or reflective surfaces suchthat the incoming signals 19 bounce off of the mirrors and are routed inthe desired direction. The reflected signals. 19 can then be passed backthrough the quarter-wave plate 26, lens 24, diffraction grating lenssystem 22 and lens 20, and may then be routed to the desired opticalfiber 16 for further transportation.

In this manner the mirror array 10 can redirect light signals from adeparture optic fiber to a destination optic fiber. The departure opticfiber may be the same as the destination optic fiber (FIG. 1), or theymay be different (not shown in FIG. 1). Furthermore, the departure opticfiber may be in the same cable 14 as, or in a different cable from, thedestination optic fiber. In other words, signals. can be routed from anyoptic fiber connected to the cross connect engine to any optic fiberconnected to the cross connect engine.

As shown in FIG. 2, the mirror array 10 may include a plurality ofmovable mirrors 30 formed in an array, with each mirror 30 including areflective surface 31 located on an associated movable portion 32. Thereflective surfaces 31 can be made from nearly any material thatreflects the light signals to be transmitted (which can be infraredlight). The reflective surfaces 31 can be made of a metal, such as gold.However, nearly any metal or material which can reflect the desiredwavelength of energy may be used as the reflective material 31. Thereflective material 31 may have a reflectivity of greater than about 95%at infrared wavelengths, and it has been found that gold is anappropriate material that may be used to reflect infrared radiation.

Each of the mirrors 30 may be relatively small (i.e., in one embodimenton the order of about 20 microns ×20 microns), and the array 10 caninclude nearly any desired number of mirrors 30 (i.e., in one embodimentabout 500 mirrors). Each movable portion 32 may be able to be rotated tomove its associated reflective surface 31 into the desired configurationto reflect light signals in the desired manner.

As shown in greater detail in FIGS. 5-7, the mirrors 30 may be locatedon an upper wafer 34. The upper wafer 34 may include or be made up oftwo separate wafers or wafer portions which are joined together to formthe upper wafer 34. The upper wafer 34 may thus be asilicon-on-insulator wafer, and/or be made of or includesilicon-on-insulator wafers. The upper wafer 34 may include a baseportion 36, and each of the movable portions 32 may be movably coupledto the base portion 36. As shown in FIG. 4, each movable portion 32 maybe defined by a set of cut outs or recesses 40, 42, 48, 50 formed in,and extending through the thickness of, the upper wafer 34. For example,the inner cut outs 40, 42 may extend generally around the outerperiphery of each movable portion 32. The ends of the inner cut outs 40,42 may be slightly spaced apart to define a pair of narrow inner arms44, 46 located on opposite sides of the associated movable portion 32.In this manner, the portion of the upper wafer 34 located inside theinner cut outs 40, 42 may be rotatable about an axis A defined by theinner arms 44, 46.

The upper wafer 34 may also include a set of outer cut outs 48, 50 thatextend generally around the outer periphery of each movable portion 32.The ends of the outer cut outs 48, 50 may be spaced apart to define apair of outer arms 52, 54 located on opposite sides of the associatedmovable portion 32. Each movable portion 28 may thus include anintermediate surface 58 located between the inner 40, 42 and outer 48,50 cut outs. In this manner, the portions of the upper wafer 34 locatedinside of the outer cut outs 48, 50 (including the intermediate surface58) may be rotatable about an axis B defined by the outer arms 52, 54.Thus the inner 40, 42 and outer 48, 50 cut outs and inner 44, 46 andouter 52, 54 arms define movable portions 32 that may double gimbaled,or independently pivotal, about both axes A and B. Of course, variousother structures and assemblies for pivotally and/or movable mountingmirrors 30, as well as various other biasing and spring mechanisms mayalso be used.

As shown in FIGS. 6 and 7, the upper wafer 34 may be asilicon-on-insulator wafer which may include a lower silicon layer orsupport layer 60, an upper silicon layer 62, and an insulating layer 64(such as silicon dioxide) located between the upper 60 and lower 62silicon layers. The lower layer 60 may have a thickness of about 100microns, and the upper layer 62 may have a thickness of about 10 microns(the relative thicknesses of the various layers are not necessarilyshown in scale in the accompanying drawings). The insulating layer 64(as well as the other insulating/passivation layers discussed herein)may be a silicon dioxide layer having a thickness of about 1 micron, butcould also be nearly any insulating or dielectric layer of any desiredthickness. Of course, the thickness and materials of the layers 60, 62,64 can be varied as desired to meet the requirements of the array 10 orother microstructure.

The lower layer 60 and upper layer 62, and in particular the upper layer62, may be made of doped silicon or other semiconductor material suchthat the upper layer 62 has a relatively high electrical conductivity.However, the lower layer 60 and upper layer 62 can also be made from avariety of other materials besides silicon, such as amorphous silicon,polysilicon, silicon carbide, germanium, polyimide, ceramics, nitride,sapphire, silicon nitride, glasses, semiconductor material, acombination of these materials or nearly any other machinable ormicromachinable material. In any case, because the movable portions 32are formed in the upper layer 62, the upper layer 62 may be electricallyconductive or have an electrically conductive material located thereonsuch that the movable portion 32 can be moved by electrical orelectrostatic forces, as will be discussed in greater detail below.

The upper layer 62 may have the desired thickness of the movableportions 32 and associated arms 44, 46, 52, 54. More particularly, thecut outs 40, 42, 48, 50 may be formed in or through the upper layer 62to form the intermediate portion 58 and inner arms 44, 46 and outer arms52, 54.

The upper wafer 34 may be coupled to a lower wafer 66 that is locatedbelow the upper wafer 34. The lower wafer 66 may be asilicon-on-insulator wafer having a silicon layer 67 and an insulatinglayer 69. The lower wafer 66 may include or be made up of two separatewafers or wafer portions which are joined together to form the lowerwafer 66. The lower wafer 66 can also be a standard silicon wafer, orcan be made of a variety of semiconducting materials beyond silicon,such as GaAs or InP, as well as the materials listed above for the upperwafer 34, or can also be or include a glass or ceramic substrate, or aprinted circuit board.

The upper wafer 34 and lower wafer 66 can be coupled together by avariety of methods and structures, including but not limited tobenzocyclobutene (BCB) bonding (which will be discussed in greaterdetail below). The bond between the upper 34 and lower 66 wafers may bedesired to be electrically insulating. Further, because elevatedtemperatures can damage certain components of the mirror array 10, itmay be desirable to use relatively low temperature bonding or othercoupling procedures for coupling the upper 34 and lower 66 wafers. Forexample, it may be desired to use adhesive or coupling medium having areflow temperature of less than about 125° C., or to use a couplingprocedure which takes place at a temperature less than about 125° C.

As shown in FIGS. 3, 5-7 and 9-11, the mirror array 10 may include aplurality of posts 68 that extend between the lower wafer 66 and upperwafer 34 and that may consist of bonding materials. However, a widevariety of other structures may extend between the upper 34 and lower 66wafers in order to couple the wafers together, including portions of theupper 34 or lower 66 wafers themselves.

The lower wafer 66 may include a plurality of electrodes or conductivesurfaces 70, 72, 74, 76 located on an upper surface 75 of the lowerwafer 66. The electrodes 70, 72, 74, 76 can be activated (such as byapplying a voltage to the electrodes or a voltage across the electrodesand the mirrors 30, reflective surfaces 31 and/or movable portions 32)to control movement of the movable portions 32 and associated reflectivesurfaces 31. As shown in FIGS. 3-5, each mirror 30 may have anassociated set of electrodes 70, 72, 74, 76 located below each mirror30. The set of electrodes can include a pair of actuating electrodes 70,72 and a pair of adjustment electrodes 74, 76. The lower wafer 66 mayinclude a protective coating (not shown) such as an oxide or otherpassivation layer located on the lower surface 75, and in particularover the electrodes 70, 72, 74, 76 to protect the electrodes 70, 72, 74,76 and prevent/limit oxidation thereof.

The mirror array 10 may include a plurality of solderable surfaces 88,or electrical connection sites 88, or flip chip connection sites 88,located around the perimeter of the array of mirrors 30. The flip chipconnection sites 88 may be located on the lower wafer 66, and each ofthe flip chip connection sites 88 may include a plurality of pads 80 ofconductive material. The pads 80 may be made of any desired material andformed by any of a wide variety of manufacturing methods. For example,the pads 80 can be a eutectic alloy or other metal (such as solder,gold, or other metals), or other conductive materials, and can beformed, created or manufactured by evaporation, electroplating, screenprinting, needle depositing, electroless plating, adhesive, or directdeposition. Each pad 80 may be made of a material or materials which aresolderable surfaces; that is, surfaces which can be electrically oroperatively coupled to another component or surface by solderconnections. In one embodiment, each pad 80 may include gold as thetop-most layer, with the gold being located on a nickel layer, and thenickel layer being located on a titanium layer. The titanium layer maybe located on an aluminum pad or other layer. However, each pad 80 canbe made from a wide variety of materials to form solderable surfaces.

The pads 80 may be formed to accommodate solder bump flip chips, platedbump flip chips, stud bump flip chips, adhesive bump flip chips, orother types of flip chips. Due to the materials of the pads 80 and flipchip bonding sites 88, the pads 80 and flip chip bonding sites 88 may bemade of materials having a relatively low melting temperature, such as,for example, less than about 250° C., or less than about 300° C., orless than about 400° C. Thus, in subsequent processing steps care shouldbe taken to not exceed the melting point of the pads 80 and flip chipbonding sites 88.

In the illustrated embodiment twenty-five pads 80 are arranged in a 5×5array to form a connection site 88. As schematically shown in FIGS. 6and 7, at least one of the pads 80, or each of the pads 80, may beelectrically or operatively coupled to at least one of the electrodes70, 72, 74, 76 to control the actuation of the electrodes 70, 72, 74,76, and each pad 80 may be electrically isolated from any adjacent pads80.

The pads 80 and connection sites 88 may be arranged to be electricallyor operatively coupled to a chip 81 or other electronic component thatis located on and supported by the lower wafer 66. For example, eachconnection site 88 may be able to accept. a chip 81 thereon by flip chipbonding or flip chip coupling (also known as direct chip attach) whichinvolves placing a chip, having electrical contacts, directly onto theflip chip connection sites 80 so that the contacts of the chip areelectrically and/or operatively coupled to the pads 80 in a well knownmanner. For example as shown in FIG. 8, a chip 81 having a plurality ofoutput bumps or contacts 83 is located on top of and coupled to theconnection site 88, pads 80 and/or lower wafer 66. The chip 81 is thencoupled to the connection site 88 (such as by soldering, conductiveadhesive, etc.) to electrically connect the chip 81 to the connectionsite 88. The pads 80 may thus be arranged in the same pattern of theoutput contacts 83 to ensure that the connection sites 88 are shaped toproperly receive a chip 81 thereon. Thus, although the illustratedembodiment shows the connection sites 88 as including a square 5×5 arrayof pads 80, the pads 80 may be sized, shaped and arranged in nearly anymanner to accommodate the size, shape and arrangement of output contacts83 of the flip chip 81 desired to be used with the array 10.

The chip 81 may be any electronic component, including a processor,electronics, memory, circuitry, ASIC, processor, controller, logic chip,or the like, and may include a plurality of transistors, such as CMOStransistors (not shown). The chip 81 may provide the logic circuitry forcontrolling the application of voltages to the electrodes 70, 72, 74,76. Of course, the chip 81 may include nearly any electroniccomponent(s) that can provide the logic and routing circuitry fordirecting the desired voltages to the electrodes 70, 72, 74, 76 in thedesired manner. However, CMOS transistors may be preferred as the logiccircuitry and as a high voltage driver because CMOS transistors userelatively low amounts of power and generate relatively little heat. TheCMOS transistors or other logic circuitry may be coupled together in amultiplexed fashion.

Alternately, or in addition, the chip 81 may include an externalconnection location 85 to enable the chip 81 to be connected to anexternal processor, printed circuit board, controller, computer, CPU orthe like, for example, via a wire bond, ribbon, or other connectionmethod. For example, in one case the chip 81 may be coupled to a PCBwith wirebonds, and the PCB may be coupled to a processor, controller orcomputer with a ribbon cable. Further, although FIG. 8 illustrates onlya single chip 81, additional ones of the connection sites 88, or all ofthe connection sites 88 of the array 10, may include a chip 81 locatedthereon, and each of the chips 81 may be coupled to external processor,controller, computer, CPU or the like. Each chip 81 may be electricallyconnected or coupled to electrodes 70, 72, 74, 76 for selected ones ofthe mirrors 30, or be electrically connected or coupled to electrodes70, 72, 74, 76 for selected rows and/or columns of the mirrors 30. Eachchip 81 may also be electrically connected or coupled to the mirrors 30(i.e. to the reflective surfaces 3 1) so that a voltage differentialbetween the electrodes 70, 72, 74, 76 and the mirrors 30 can bemaintained and controlled. The mirrors 30 (i.e. the reflective surfaces31) may instead be grounded so that the voltage differential between theelectrodes 70, 72, 74, 76 can be precisely known.

As can be seen in FIG. 2, in the illustrated embodiment, in top view theupper wafer 34 is generally rectangular and is located within theperimeter of the generally rectangular lower wafer 66. In other words,the upper wafer 34 is located within or contained within the “coveragearea” or “footprint” of the lower wafer 66 in top view. Thus, in thiscase the lower wafer 66 includes an “underhang” portion 87 protrudingoutwardly relative to the upper wafer 34, or not covered by or locatedunder the upper wafer 34.

Each of the connection sites 88 may be located on the underhang portion87 to ensure that the connection sites 88 can be easily accessed toenable a chip 81 to be easily coupled to each connection site 88. Inthis manner, each connection site 88, as well as each chip 81, may belocated outside the coverage area or footprint of the upper wafer 34.Further, the footprint of the lower wafer 66 need not necessarily belarger than the footprint of the upper wafer 34. Instead, all that isrequired is that the lower wafer 66 have a surface upon which aconnection site 88 can be located, wherein that surface is not coveredby or located below the upper wafer 34. Thus, the underhang portion 87provides a surface upon which a chip 81 can be easily coupled.

For example, the coverage area or footprint of the upper wafer 34 may beviewed as the shadow cast by the upper wafer 34 by a light sourcelocated directly above the upper wafer 34. Thus, the portions of thelower wafer 66 which are not located directly below a portion of theupper wafer 34 may be considered to be outside the coverage area of theupper wafer, even if those portions of the lower wafer 66 are locatedaway from the outer perimeter of the upper wafer 66 (i.e. are locatedbelow an opening formed in the upper wafer 34) or adjacent to irregularouter edges of the upper wafer 34.

By providing the connection sites 88 which can receives chips 81thereon, the entire array 10 can be manufactured without having anychips or complex electronics located on the array 10, which can besuspect to damage during manufacturing. After the array 10 ismanufactured, or even after the array 10 is shipped to a customer, thechips 81 may then be coupled to the connection sites 88 as a finalassembly step. Furthermore, the manufacturing of the mirrors 30 and thebody of the array 10 can be manufactured separately from the electronicsor chips 81. Thus, through this “modular” manufacturing, unacceptablearrays 10 and chips 81 can be discarded before assembly, therebyimproving the yield of the end product. The use of a chip 81 and flipchip manufacturing also reduces the need for wire bonding and improvesefficiency of manufacturing and the robustness of the array 10, and mayreduce parasitic effects and improve transmission speed.

In order to operate the mirror array 10 of FIGS. 2-7, a processor,controller, computer or CPU or the like is connected to all or selectedones of the chips 81. The controller can then provide signals to thechips 81 which are processed and analyzed by the chips 81 to determinehow to apply various voltages in the desired manner to the desiredelectrodes 70, 72, 74, 76. Further, a specific mirror or mirrors, ormirror address(es) may be provided from the controller for actuation.

For example, as best shown in FIG. 6, in order to rotate the mirror 30shown therein, a positive or negative AC or DC voltage may be applied tothe actuating electrode 72 (i.e. across the electrode 72 and theassociated mirror 30). The amount of voltage applied to the electrode 72can be any amount of voltage to achieve the desired rotation, forexample, in one case about 200 volts. The mirror 30 and/or reflectivesurface 31 and/or movable portion 32 may be grounded by, for example,grounding each mirror to the bulk of the upper wafer 34. The voltages inthe actuating electrode 72 creates an electrostatic force that causesthe conductive movable portion 32 to rotate in the direction of arrow C(i.e., about axis A and about inner arms 44, 46 (see FIGS. 4 and 8)). Asthe movable portion is rotated or tilted, the reflective surface 31located thereon is also thereby tilted to the desired configuration. Thedegree of rotation of the movable portion 32 can be controlled by thevoltages applied to the electrode 72. In this manner each mirror 30 canbe rotated to the desired inclination to reflect an incoming lightsignal in the desired direction.

When the movable portion 32 and reflective surface 31 are rotated aboutaxis A, the inner arms 44, 46 are twisted or placed in a state oftension/compression. Thus, when the voltage applied to the actuatingelectrode 72 is removed or sufficiently reduced, the movable portion 32and mirror 30 may rotate in the direction opposite to arrow C to returnthe movable portion 32 to its neutral position shown in FIG. 6. In thismanner, the spring force of the inner arms 44, 46 returns the movableportion 32 and mirror 30 to their neutral position. Thus, the forcesapplied by the electric field of the actuating electrode 72 mustovercome the spring force of the arms 44, 46 in order to cause rotationof the associated movable portion 32. The movable portion 32 can bemoved in the direction opposite to arrow C by applying a voltage toelectrode 70 while the mirror 30 is grounded.

The adjustment electrodes 74, 76 can be used to provide another degreeof freedom to the movable portion 32. In other words, a voltage can beapplied to the adjustment electrodes 74, 76 to set up an electricalfield that can cause the movable portion to rotate about the outer arms52, 54 (about axis B of FIG. 4) and in the directions of arrow D (FIG.7).

In this manner, the external controller and/or the chips 81 can executecontrol over each set of electrodes 70, 72, 74, 76 associated with eachmovable portion 32 and mirror 30 to simultaneously control the movementof each mirror 30. The array 10 can thereby be controlled by thecontroller and/or chips 81 to reflect a large number of beams of lightsignals to carry out the switching function of the mirror array 10. Asnoted above, the mirrors 30 may be grounded so that the voltagedifferential between the electrodes 70, 72 and the mirrors 30 can beprecisely controlled.

FIGS. 9-11 illustrate a method for forming/singulating the mirror array10 of FIGS. 2-8, although various other methods of forming the mirrorarray 10 may be used without departing from the scope of the invention.The array 10 may be batch processed such that a plurality of movableportions, reflective surfaces, mirrors, electrodes, control electronicsand the like are simultaneously formed on a wafer or wafers. However,for ease of illustration, FIGS. 9-11 illustrate only two adjacentmirrors and the associated components being formed. Further, FIGS. 9-11are representative cross-sections which are intended to illustratevarious features of the manufacturing process, and may not identicallyrepresent a cross-section of the device.

FIG. 11 illustrates two adjacent mirrors 30. However, it should beunderstood that each mirror 30 shown in FIG. 11 may be only a singlemirror in an array of mirrors. For example, the left-hand mirror 30shown in FIGS. 11 may be only a single mirror 30 of a larger array 1Oaand the right-hand mirror 30 may be only a single mirror in a largerarray 10 b.

The process may begin by providing/forming an upper wafer 34 which caninclude a plurality of inner arms 44, 46, outer arms 52, 54, baseportions 36, movable portions 32, cut outs 40, 42, 48, 50, etc. Theinner arms 44, 46, outer arms 52, 54, base portions 36, movable portions32, cut outs 40, 42, 48, 50 can be formed by various processes andmethods, including deep reactive ion etching (“DRIE”) through upperwafer 34 or the upper layer 62 of the upper wafer 34. The movableportions 32 may or may not include the reflective material 30 locatedthereon. The upper wafer 34 may be processed to various stages ofcompletion, and in the illustrated embodiment the upper wafer 34 isnearly completely processed except for the addition of the reflectivematerial 30.

A lower wafer 66 may then be provided. The lower wafer 66 may alsoinclude the metallization portions located thereon, such as a pluralityof electrodes 70, 72, 74, 76, pads 80 and bonding sites 88. The pads 80and bonding sites 88 may be formed on what will ultimately form theunderhang portions 87.

The upper wafer 34 may then be bonded or coupled to the lower wafer 66.Any of a wide variety of methods for attaching the upper 34 and lower 66wafers may be used. However, it may be preferred that the upper 34 andlower 66 wafers be coupled at a relatively low temperature, such as, forexample, temperatures less than about 250° C. to protect the solderablesurfaces, such as the bonding sites 88 and pads 80. Low temperaturebonding can also reduce the stress effects caused by materials havingdiffering coefficients of thermal expansion, reduce the diffusivemigration and oxidation of materials, and provide a process which iseasier to control and implement. The bonding or coupling process maytake place at a temperature below the melting or reflow temperature ofthe metallization of the lower wafer 66, such as the pads 80 and flipchip connection sites.88. For example, a bonding or coupling processwhich can take place at temperatures below 400° C., or below 300° C., orbelow 250° C. may be used to couple the upper wafer 34 and lower wafer66.

In one embodiment, the upper 34 and lower 66 wafer are coupled by a BCBbonding process, which is discussed in detail below and shown in FIGS.12-14. The BCB or other suitable bonding processes may protect themetallization of the lower wafer 66, which may have a melting or reflowtemperature of around or below 250° C., 300° C. or 400° C. As notedabove, it should be appreciated that the upper 34 and lower 66 wafersmay be processed to various stages of completion prior to their bondingor coupling, and further processing of the upper 34 and lower 66 wafersafter bonding or coupling may be required to produce the upper 34 andlower 66 wafers in their states shown in FIG. 9.

After the assembly of FIG. 9 is provided, a pair of upper singulationetches or cavities 91 may be formed through the thickness of the upperwafer 34, and the lower wafer 66 may then be etched to include a pair oflower singulation cavities 89, or partial etches, formed through aportion of the thickness of the silicon layer 67. Either or both of heupper singulation cavities 91 and lower singulation cavities 89 may alsobe formed prior to coupling the upper wafer 34 and lower wafer 66together. The cavities 89, 91 may be formed by DRIE or other suitableetching methods. In the illustrated embodiment the lower singulationcavities 89 do not extend entire through the thickness of the lowerwafer 66, but may extend more than one half the thickness of the siliconlayer 67, such as, for example, about ⅔ through the thickness of thesilicon layer 67 to leave a relative thin tab 95 above the singulationcavities 89. However, both or either of the singulation cavities 89, 91may extend completely or partially through the associated wafer.

The singulation cavities 89, 91 may be formed in or adjacent to a bodyportion 93 located between two separate arrays 10 a, 10 b which aredesired to be singulated (i.e. separated or divided). A plurality ofsingulation cavities 89, 91 beyond those shown in FIG. 10 may be formedor etched wherever the wafers 34, 66 are desired to be singulated orseparated into sub-wafers or wafer portions

Each of the cavities 89, 91 may extend generally vertically, orgenerally perpendicular to the arrays 10 a, 10 b, or generallyperpendicular to the wafers 34, 66. The upper singulation cavities 91may be laterally offset from (i.e. not vertically aligned with) thelower singulation cavities 89. For example, each upper singulationcavity 91 may be located closer to the associated, adjacent mirror 30 orarray 10 a, 10 b than the associated lower singulation cavity 89. Inother words, the left hand upper singulation cavity 91 may be locatedcloser to the left hand mirror 30 or movable portion 32 of FIG. 10 thanthe left hand lower singulation cavity 89, and the right hand uppersingulation cavity 91 may be located closer to the right hand mirror 30or movable portion 32 than the right hand lower singulation cavity 89.As will be discussed below, the offset nature of the singulationcavities 89, 91 enable the adjacent arrays 10 a, 10 b to have theunderhang portion 87 upon which the bonding sites 88 and chip 81 can belocated.

As shown in FIG. 11, if not previously deposited the reflective material31, such as gold or another metal, may then be deposited on the movableportions 32 to form the mirrors 30 thereon. The reflective material maybe deposited by sputtering a metal through a shadow mask and onto themovable portion 32, or by any other acceptable process.

The tabs 95 may then be broken to separate the adjacent arrays (10 a and10 b) from each other, and the body portion 93 located between thearrays 10 a, 10 b can be discarded. The offset nature of the cavities89, 91 enables each lower wafer 66 to have a larger footprint than theupper wafer 34 to provide the underhang portions 87. In other words,each of the arrays 10 a, 10 b is singulated along a dividing line 97(FIG. 10) which includes two offset, generally vertically extendingportions (defined at least partially by the cavities 89, 91)

A wide variety of configurations of the dividing lines 97 and uppercavities 91 and lower cavities 89 may be used. For example, the tab 95can be located at nearly any location throughout the thickness of the ofthe upper 34 or lower 66 wafers and need not necessarily be locatedabove the lower singulation cavity 89. Further, instead of having twospaced lower cavities 89, only a single lower cavity 89 may be used.

Next, if desired, a cap (not shown) may be coupled to and located overeach array 10 a, 10 b to protect the mirrors 30. A chip or chips 81 canthen be coupled to the bonding sites 88. Each chip 81 may then becoupled to the associated bonding site 88, such as by flip chip bondingor other coupling processes, and the chip 81 and/or bonding sites 88 maybe under filled in a well-known manner. Each array 10 a, 10 b can thenbe located in or formed as part of an optical cross-connect engine.

Although FIGS. 9-11 illustrate a process for coupling upper 34 and lower66 wafers together to form a micro mirror array, it should be understoodthat the singulation process described herein, which may be implementusing offset cavities or etching, can be utilized to singulate nearlyany desired micromachine, micro device, microelectromechanicalstructure, and the like.

As can be seen from the manufacturing process as described above, thelower wafer 66 and upper wafer 34 may each be at least partiallypremanufactured and tested before they are joined together. Further, thechips 81 can be manufactured or acquired separately. This modularmanufacturing provides greater flexibility in manufacturing the mirrorarray 10 and raises the overall yield of the arrays 10. For example, anumber of upper 34 and lower 66 wafers can be premanufactured and testedaccording to varying specifications, and the premanufactured andapproved upper 34 and lower 66 wafers can then be stored. A number ofchips 81 having varying specifications can also be manufactured oracquired and tested. When an order for an array 10 is received from acustomer, the upper 34 and lower 66 wafers and chips 81 that correspondto the parameters of the desired array can then be obtained, joinedtogether and processed to completion. Furthermore, premanufacturing thewafers 34, 66 and chips 81 enables any faulty wafers 34, 66 or chips 81to be detected and disposed of before they are coupled together whichthereby increases the overall yield of the array manufacturing process.

FIGS. 12-14 illustrate one method for coupling the upper 34 and lower 66wafers together, such as during the step shown in FIG. 9 above. For easeof illustration, FIGS. 12-14 illustrate two generic wafers 200, 202being coupled together, although it should be understood that the wafers200, 202 can correspond to the upper 34 and lower 66 (as well as anyother wafers which are desired to be coupled).

The wafers 200, 202 may first be cleaned and an adhesion promoter may beapplied to the wafers 200, 202. A layer of benzocyclobutene (“BCB” tradename CYCLOTENE® 4024-40 manufactured by the Dow Chemical Company ofMidland, Mich.), which is a negative tone photoresist, 204 may beapplied to at least one of the wafers 200, 202, such as by spinning theBCB layer 204 thereon. (FIG. 12). Materials other than BCB may also beused as the bonding layer 204. For example, polyimide, SU8 (a negative,epoxy-type, near-UV photoresist based on EPON SU-8 epoxy resin sold byShell Chemical), or other patternable or photopatternable adhesives witha low cure temperature may be used. The layer 204 may be spun to anydesired thickness, such as a thickness of between about 0.25 microns orless and about 20 microns or more, and in one embodiment the layer 204has a thickness of about 4.5 microns.

Next, the layer 204 may be exposed to a “soft bake” to at leastpartially harden the layer 204 for subsequent photopatterning. In oneembodiment, the soft bake includes exposing the wafer 200 to atemperature of about of about 75° C. for about 180 seconds. However, thesoft bake may be carried out for sufficient time and under sufficienttemperatures until the layer 204 is sufficiently hardened or cured toallow photopatterning of the layer 204, while still allowing sufficientsolvents to remain in the layer 204 for subsequent bonding. The softbake elevates the glass transition temperature of the BCB for safehandling at room temperature.

Next, the layer 204 may be patterned by, for example, exposing portionsof the layer 204 which are desired to remain to electromagnetic (i.e.UV) radiation while shielding portions of the layer 204 which are notdesired to be removed from the radiation. The UV radiation initiatescrosslinking in the exposed portions of the layer 204 while the shieldedportions of the layer 204 are protected, such as by a mask, from theradiation to prevent crosslinking. In this case, any portions of thewafer 200 (or wafers 34,66) which are desired to be contacted andadhered to the wafer 202 may be exposed to the radiation. The layer 204may then undergo a pre-develop bake to further encourage crosslinking ofportions of the layer 204 which are not desired to be removed. In oneembodiment, the pre-develop bake may include exposure to a temperatureof about 75° C. for about 90 seconds. However, the pre-develop bake maybe carried out for sufficient times and under sufficient temperaturesuntil the portions of the layer 204 which are desired to remain aresufficiently crosslinked.

The non-crosslinked portions of the layer 204 may then be removed in adevelop process using a puddle or immersion developer process. The wafer200 may then be dried thereby resulting in the wafers 200, 202 shown inFIG. 13. The wafer 200 may then be cleaned in a “descumming” process toremove any residual, dilute BCB on the wafer 200.

The layer 204 may then be allowed to cure at room temperature (i.e.about 68° F. or 20° C.) for about 8 hours. However, this BCB cure stepmay be carried out for sufficient times and under sufficienttemperatures to raise the glass transition temperature of the layer 204to provide a stable BCB layer 204 and control reflow of the layer 204during subsequent processing (except for during bonding). This BCB curestep further elevates the glass transition temperature of the layer 204in preparation of bonding.

The wafers 200, 202 may then be placed into contact in the desiredorientation and pressed together for bonding (FIG. 14). In oneembodiment, the bond is cured by exposing the wafers 200, 202 totemperature of about 250° C. under a force of about 100lb for about 30minutes. However; this bond cure step may be carried for sufficienttimes and under sufficient temperatures and pressures until the portionsof the layer 204 form a sufficient bond between the wafers 200, 202.

Thus, BCB layer 204 provides a photopatternable adhesive for the wafers200, 202 so that the adhesive 204 can be easily patterned and arrangedin the desired manner. Further, the layer 204 can be easily deposited,provides wafer rework capabilities and is generally homogeneous.

BCB or other similar materials can also be used as a passivation orelectrical isolation layer. For example, as shown in FIG. 15, a BCBpassivation layer 206 can be located over any conductive portions orlayers which are desired to be isolated, such as a metallic interconnectlayer 208. The passivation layer 206 can be located on the wafer200/interconnect layer 208 and spun to form an even coating havingnearly any desired thickness. The soft bake and photo patterning stepsdescribed above in the context of FIGS. 12-14 may then be used so thatundesired portions of the passivation layer 206 are removed. Forexample, the passivation layer 206 may be etched to form a via 210 toexpose at least a portion of the metal interconnect 208.

The passivation layer 206 may then be “hard” cured to generally fullycure the BCB and generally drive out any solvents to provide a hard,stable passivation layer 206. The hard cure may raise the glasstransition temperature of the passivation layer 206 beyond bondtemperatures so that any subsequent bonding steps involving the wafer200 do not affect or cause reflow of the passivation layer 206, and sothat the passivation layer 206 is generally insensitive to light andgenerally inert to BCB ancillary chemical and etchants.

If desired, leads 212 (FIG. 16) may then be deposited onto thepassivation layer 206 and in contact with the metal interconnect 208. Ofcourse, various other steps, etching, manufacturing, processing and thelike can occur at this stage as well. Next, a bonding layer 204 (such asBCB) may be located on top of the.passivation layer 206. The bondinglayer 204 may then be etched, baked, cured, and otherwise processed asdescribed above in order to enable the wafer 202 to be coupled to thewafer 200. FIG. 17 illustrates the bonding layer 204 after etching.

Wafer 202, which is desired to be coupled to wafer 200, may then beprovided, as shown in FIG. 18. In the illustrated embodiment, wafer 202includes a plurality of cutouts or notches 219 formed therein, with eachnotch being sized and located to receive a portion of the BCB bondinglayer 204 therein. The wafer 202 may then be located on top ofpassivation layer 206 and the bonding layer 204, as shown in FIGS. 18and 19. Heat and temperature are then applied to the wafer stack to bondthe wafer 202 to the wafer 200 as described above in the context of FIG.14. The wafer 200 may be bonded to the wafer 202 at a temperature abovethe glass transition temperature of the bonding layer 204, but below theglass transition temperature of the passivation layer 206.

The passivation layer 206 may be located between any portions of thewafers 200, 202 to ensure that the wafers 200, 202 remain electricallyisolated due to the dielectric qualities of BCB. For example, the loweror bond surface 232 of the wafer 202 contacts the passivation layer 206,instead of the lead 208. In this manner, the passivation layer 206electrically isolates the wafer 202 from the lead 208, and from thewafer 200. Thus, the layer 206 can be used as a passivation layer.

It should be understood that the bonding and bonding/passivation stepshown in FIGS. 15-19 may be used for nearly any wafer or wafer portions.In particular, the bonding and bonding/passivation method as disclosedtherein may be used in any microstructure to couple and/or passivate amicrostructure or various portions of a microstructure. Suchmicrostructures may, in one embodiment, include the array 10 disclosedherein, but the processes disclosed herein can also be used with a widevariety of other microstructures beyond the array 10, including a widevariety of sensors or actuators.

Having described the invention in detail and by reference to thepreferred embodiments, it will be apparent that modifications andvariations thereof are possible without departing from the scope of theinvention.

1. A micro mirror array comprising: an upper wafer portion including aplurality of movable reflective surfaces located thereon, said upperwafer portion defining a coverage area in top view; and a lower waferportion located generally below and coupled to said upper wafer portion,said lower wafer portion including at least one connection site locatedthereon, said at least one connection site being electrically oroperatively coupled to at least one component which can control themovement of at least one of said reflective surfaces, said at least oneconnection site generally not being located within said coverage area ofsaid upper wafer portion.
 2. The array of claim 1 wherein said lowerwafer portion includes a plurality of connection sites, each of saidconnection sites being electrically or operatively coupled to acomponent which can control the movement of at least one of saidreflective surfaces, wherein each connection site is not generallylocated within said coverage area of said upper wafer portion.
 3. Thearray of claim 2 each of said components is an electrode located on saidlower wafer portion for controlling the movement of at least one movablereflective surface when a voltage or current is applied across said atleast one movable reflective surface and said electrode.
 4. The array ofclaim 3 wherein at least two electrodes are located below each of saidreflective surfaces such that a voltage can be applied across each ofsaid electrodes and an associated reflective surface to cause theassociated reflective surface to move in at least two generally oppositedirections.
 5. The array of claim 3 wherein each reflective surface islocated on a movable portion such that when a voltage is applied acrossan associated electrode and said reflective surface or said movableportion such voltage causes movement of the associated movable portionand of the associated reflective surface.
 6. The array of claim 2wherein said connection sites can carry sufficient bandwidth to enable acontroller coupled to said connection sites to cause and control theindividual movement of each reflective surface relative to any adjacentreflective surfaces.
 7. The array of claim 1 wherein said at least oneconnection site includes a solderable surface configured to receive anelectronic component thereon in a direct attachment manner.
 8. The arrayof claim 7 wherein said at least one connection site is electrically oroperatively coupled to a component which can control the movement of atleast one of said reflective surfaces.
 9. The array of claim 7 whereinsaid at least one connection site has a melting point of less than about250° C.
 10. The array of claim 7 further including a chip or electroniccomponent electrically or operatively coupled to and supported by saidat least one connection site such that said chip or electronic componentcan control the movement of at least one of said movable reflectivesurfaces.
 11. The array of claim 10 wherein said chip or electroniccomponent is a flip chip that is coupled to said connection site by flipchip bonding.
 12. The array of claim 10 further comprising a controllercoupled to said chip or electronic component to provide control signalspassed to said connection site by said chip or electronic component tothereby control the movement of said at least one reflective surface.13. The array of claim 7 wherein said at least one connection siteincludes a plurality of conductive pads, each pad being electricallyisolated from any adjacent pads.
 14. The array of claim 1 wherein saidlower wafer portion has a coverage area in top view and wherein saidcoverage area of said upper wafer portion is entirely contained withinsaid coverage area of said lower wafer portion.
 15. The array of claim 1wherein said upper wafer portion includes an outer perimeter in topview, and wherein said at least one connection site is located adjacentto said outer perimeter.
 16. The array of claim 1 wherein said upperwafer portion includes an outer perimeter, and wherein said outerperimeter defines said coverage area.
 17. The array of claim 1 whereinsaid upper and lower wafer portions are coupled together by aphotopatternable adhesive.
 18. The array of claim 17 wherein saidphotopatternable adhesive is benzocyclobutene.
 19. The array of claim 1wherein said upper and lower wafer portions are coupled together by arelatively low temperature adhesive, said adhesive having a reflowtemperature of less than about 125° C.
 20. The array of claim 1 whereineach reflective surface is individually movable relative to any adjacentreflective surface and is individually controllable.
 21. The array ofclaim 1 wherein said upper wafer portion includes a silicon layer, andwherein said reflective surfaces are located on, adjacent to, orsupported by said silicon layer.
 22. The array of claim 1 wherein saidupper wafer portion includes a base portion and a plurality of movableportions rotatably coupled to base portion, and wherein each reflectivesurface is located on one of said movable portions.
 23. The array ofclaim 1 wherein said upper wafer portion includes at least a portion ofat least one silicon-on-insulator wafer.
 24. The array of claim 1wherein each reflective surface is independently movable about twogenerally perpendicular axes.
 25. The array of claim 1 wherein saidlower wafer portion is or includes at least part of a semiconductorwafer, or a ceramic substrate, or a glass substrate, or a printedcircuit board.
 26. The array of claim 1 wherein said lower wafer portionincludes an upper surface facing said upper wafer portion, and whereinsaid at least one connection site is located on said upper surface. 27.A micro mirror array comprising: an upper wafer portion including aplurality of movable reflective surfaces located thereon; and a lowerwafer portion located generally below and coupled to said upper waferportion, said lower wafer portion including a plurality of componentswhich can control the movement of said reflective surfaces, said lowerwafer portion including at least one electronic component locatedthereon which is electrically or operatively coupled to at least one ofsaid components such that said electronic component can control themovement of at least one of said movable reflective surfaces locatedadjacent to said at least one of said components.
 28. A microstructuresystem including: a wafer portion including a microstructure formedtherein, located thereon or supported thereby; and a solderable surfaceconfigured to receive an electronic component thereon in a directattachment manner, said solderable surface being formed on, located on,or supported by said wafer portion, said solderable surface beingelectrically or operatively coupled to said microstructure such that anelectronic component coupled to solderable surface can control, operateor receive inputs from at least part of said microstructure.
 29. Themicrostructure system of claim 28 wherein said wafer portion includes anupper wafer portion and a lower wafer portion located generally belowand at least partially spaced apart from said upper wafer portion, andwherein said microstructure is formed in or located on said upper waferportion, and wherein said solderable surface is formed or located onsaid lower wafer portion.
 30. The microstructure system of claim 29wherein said upper wafer portion defines a coverage area in top view,and wherein said solderable surface is not located within said coveragearea.
 31. The microstructure system of claim 30 wherein said upper waferportion includes an outer perimeter, and wherein said outer perimeterdefines said coverage area.
 32. The microstructure system of claim 30wherein said lower wafer portion has a coverage area in top view andwherein said coverage area of said upper wafer portion is entirelycontained within said coverage area of said lower wafer portion.
 33. Themicrostructure system of claim 28 wherein said wafer portion includes anupper wafer portion and a lower wafer portion located generally belowand at least partially spaced apart from said upper wafer portion, andwherein said microstructure is formed in or located on one of said upperor lower wafer portions, and wherein said solderable surface is formedor located on the other of said upper or lower wafer portion, andwherein said upper and lower wafer portions are coupled together. 34.The microstructure system of claim 33 wherein said upper wafer and lowerwafer portions are coupled together by a photopatternable adhesive. 35.The microstructure system of claim 34 wherein said photopatternableadhesive is benzocyclobutene.
 36. The microstructure system of claim 33wherein said upper wafer and lower wafer portions are coupled togetherby a relatively low temperature adhesive, said adhesive having a reflowtemperature of less than about 125° C.
 37. The microstructure system ofclaim 28 wherein said solderable surface is a flip chip connection siteconfigured to receive a chip thereon by flip chip bonding.
 38. Themicrostructure system of claim 28 wherein said solderable surfaceincludes a plurality of conductive pads, each pad being electricallyisolated from any adjacent pad and having a melting point of less thanabout 250° C.
 39. The microstructure system of claim 28 furtherincluding an electronic component coupled to said solderable surfacesuch that said electronic component can control, provide inputs to orreceive outputs from said microstructure.
 40. The microstructure systemof claim 39 wherein said electronic component is a chip and wherein saidchip is coupled to said solderable surface by flip chip bonding.
 41. Themicrostructure system of claim 28 further including a plurality ofsolderable surfaces located on, or supported by said wafer portion, eachsolderable surface being electrically or operatively coupled to saidmicrostructure.
 42. The microstructure system of claim 41 furthercomprising a plurality of electronic components, each electroniccomponent being coupled to one of said plurality of solderable surface,the system further including a controller coupled to said electroniccomponents to control the input to or output from said electroniccomponents via said solderable surfaces to thereby control or monitorthe input to or output from said microstructure.
 43. The microstructuresystem of claim 28 wherein said microstructure is at least one of asensor or an actuator.
 44. The microstructure system of claim 28 whereinsaid microstructure is a mirror array including a plurality of movablereflective surfaces.
 45. The microstructure system of claim 44 furtherincluding at least one component which can control the movement of atleast one of said reflective surfaces, wherein said solderable surfaceis electrically or operatively coupled to said at least one component.46. The microstructure system of claim 45 wherein said component is anelectrode for controlling the movement of said at least one movablereflective surface when a voltage or current is applied across saidelectrode and said at least one reflective surface.
 47. Themicrostructure system of claim 46 wherein at least two electrodes arelocated below each of said reflective surfaces such that a voltage canbe applied across said electrodes and the associated reflective surfacesto cause the associated reflective surface to move in at least twogenerally opposite directions.
 48. The microstructure system of claim 44wherein each reflective surface is individually movable relative to anyadjacent reflective surfaces and is individually controllable.
 49. Themicrostructure system claim 44 wherein said solderable surface can carrya sufficient bandwidth to allow a controller coupled to said solderablesurface to cause and control the individual movement of each reflectivesurface relative to any adjacent reflective surfaces.
 50. Themicrostructure system of claim 44 wherein said wafer portion includes anupper wafer portion and a lower wafer portion located generally belowand at least partially spaced apart from said upper wafer portion, andwherein said mirror array is formed in or located on said upper waferportion, and wherein said solderable surface is formed in, located on orsupported by said lower wafer portion.
 51. The microstructure system ofclaim 50 wherein said upper wafer portion includes a silicon layer, andwherein said reflective surfaces are located on said silicon layer. 52.The microstructure system of claim 50 wherein said upper wafer portionincludes a base portion and a plurality of movable portions rotatablycoupled to base portion, and wherein each reflective surface is locatedon one of said movable portions.
 53. The microstructure system of claim50 wherein said upper wafer portion includes at least a portion of atleast one silicon-on-insulator wafer.
 54. The microstructure system ofclaim 50 wherein said lower wafer portion is or includes at least partof a semiconductor wafer, or a ceramic substrate, or a glass substrate,or a printed circuit board.
 55. The microstructure system of claim 50wherein said lower wafer portion includes an upper surface facing saidupper wafer portion, and wherein said solderable surface is located onsaid upper surface.
 56. A microstructure system including: an upperwafer or wafer portion including a microstructure formed therein,located thereon or supported thereby, said upper wafer portion defininga coverage area in top view; and a lower wafer or wafer portion locatedgenerally below and coupled to said upper wafer or wafer portion, saidlower wafer or wafer portion including an electronic component locatedthereon or supported thereby, said electronic component beingelectrically or operatively coupled to said microstructure such thatsaid electronic component can control, operate or receive inputs from atleast part of said microstructure, wherein said electronic component isgenerally not located within said coverage area of said upper waferportion.
 57. A method for manufacturing a micro mirror array comprisingthe steps of: providing an upper wafer or wafer portion including aplurality of movable portions located thereon; providing a lower waferor wafer portion; forming at least one connection site on said lowerwafer or wafer portion; forming a plurality of components on said lowerwafer or wafer portion, wherein each component can control the movementof at least one movable portion when located adjacent to one of saidmovable portions, said connection site being electrically or operativelycoupled to at least one of said components; coupling said upper andlower wafers or wafer portions together to form a wafer stack; locatinga reflective material on each of said movable portions; and singulatingsaid wafer stack to provide at least one mirror array having at leastpart of said upper wafer or wafer portion which defines a coverage areain top view, and wherein said connection site of said lower wafer is notlocated inside said coverage area of said upper wafer.
 58. The method ofclaim 57 wherein said singulating step includes singulating said waferstack to provide at least two mirror arrays, each mirror array having atleast part of said upper wafer or wafer portion which defines a coveragearea in top view, and wherein both of said mirror arrays includeconnection sites not located inside the coverage area of the associatedpart of said upper wafer or wafer portion.
 59. The method of claim 57wherein said singulating step includes singulating said wafer stackalong two dividing lines, each of said dividing lines extendinggenerally perpendicular to said wafer stack, each dividing lineincluding first and second portions that are laterally spaced from eachother.
 60. The method of claim 59 further including the step of forminga pair of spaced lower singulation cavities in said lower wafer or waferportion, each of which form one of said first or second portions of oneof said dividing lines.
 61. The method of claim 60 wherein the methodfurther includes the step of forming a pair of upper singulationcavities in said upper wafer or wafer portion, said upper singulationcavities being generally laterally offset from the associated lowersingulation cavities after said coupling step, each of said uppersingulation cavities forming the other of said first or second portionsof said dividing lines.
 62. The method of claim 61 wherein saidsingulating step includes removing portions of said wafer stack locatedgenerally above or below at least one of said upper or lower singulationcavities such that said wafer stack can be singulated along saiddividing lines.
 63. The method of claim 57 further comprising the stepof etching said upper wafer or said upper wafer portion to define a baseportion and said plurality of a movable portions movably coupled to saidbase portion.
 64. The method of claim 57 wherein each of said componentsis an electrode located on said lower wafer or wafer portion forcontrolling the movement of at least one movable reflective surface whena voltage or current is applied across said electrode and the associatedmovable reflective surface.
 65. The method of claim 57 wherein said atleast one connection site is a solderable surface.
 66. The method ofclaim 57 wherein said at least one connection site includes a flip chipconnection site configured to receive a chip thereon in a flip chipattachment manner.
 67. The method of claim 57 wherein said at least oneconnection site has a melting point of less than about 250° C.
 68. Themethod of claim 57 further including the step of electrically coupling achip to said at least one connection site by flip chip bonding.
 69. Themethod of claim 57 wherein after said singulating step said mirror arrayhas at least part of said lower wafer portion or wafer portion whichdefines a coverage area in top view, and wherein said singulation stepis carried out such that said coverage area of said at least part ofsaid upper wafer or wafer portion is entirely contained within saidcoverage area of said at least part of said lower wafer or waferportion.
 70. The method of claim 57 wherein said at least part of saidupper wafer or wafer portion includes an outer perimeter in top view,and wherein said at least one connection site is located adjacent tosaid outer perimeter.
 71. The method of claim 57 wherein said at leastpart of said upper wafer or wafer portion includes an outer perimeter,and wherein said outer perimeter defines said coverage area.
 72. Themethod of claim 57 wherein said coupling step including coupling saidupper and lower wafers or wafer portions by a photopatternable adhesive.73. The method of claim 72 wherein said photopatternable adhesive isbenzocyclobutene.
 74. The method of claim 57 wherein said coupling stepincludes coupling said upper and lower wafers together using a processentirely taking place at a temperature of less than about 125° C. 75.The method of claim 57 wherein each reflective surface is individuallymovable relative to any adjacent reflective surface and is individuallycontrollable.
 76. The method of claim 57 wherein said at least oneconnection site can carry sufficient bandwidth to enable a controllercoupled to said connection site to cause and control the individualmovement of each reflective surface relative to any adjacent reflectivesurfaces.
 77. The method of claim 57 wherein said upper wafer or waferportion includes a silicon layer, and wherein said movable portions arelocated on, adjacent to, or supported by said silicon layer.
 78. Themethod of claim 57 wherein each movable portion is independently movableabout two generally perpendicular axes.
 79. The method of claim 57wherein said lower wafer or wafer portion is or includes at least partof a semiconductor wafer, or a ceramic substrate, or a glass substrate,or a printed circuit board.
 80. The method of claim 57 wherein saidlower wafer or wafer portion includes an upper surface facing said upperwafer or wafer portion after said coupling step, and wherein said atleast one connection site is located on said upper surface.
 81. A methodfor manufacturing a microstructure system comprising the steps of:providing an upper wafer or wafer portion including a microstructureformed therein or located thereon; providing a lower wafer or waferportion including a solderable surface configured to receive anelectronic component thereon in a direct attachment manner; and couplingsaid upper and lower wafer or wafer portions together to form a waferstack such that said solderable surface is electrically or operativelycoupled to at least part of said microstructure such that an electroniccomponent coupled to said solderable surface can control, operate, orreceive inputs from at least part of said microstructure.
 82. The methodof claim 81 further comprising the step of directly attaching anelectronic component to said solderable surface.
 83. The method of claim81 wherein said solderable surface is a flip chip connection site thatis configured to receive a chip thereon in a flip chip attachmentmanner.
 84. The method of claim 83 further including the step ofcoupling a chip to said flip chip connection site by flip chip bonding.85. The method of claim 81 wherein said upper wafer or wafer portiondefines a coverage area in top view, and wherein said solderable surfaceis not located within said coverage area after said coupling step. 86.The method of claim 81 wherein said upper wafer or wafer portionincludes a plurality of movable portions located thereon, and whereinsaid lower wafer or wafer portion includes a plurality of componentswhich can control the movement of said movable portions, said solderablesurface being electrically or operatively coupled to at least one ofsaid components.
 87. The method of claim 86 wherein said components areelectrodes located on said lower wafer or wafer portion for controllingthe movement of at least one movable portion when a voltage or currentis applied across said movable portion and an associated electrode. 88.The method of claim 81 wherein said solderable surface has a meltingtemperature of less than about 250° C.
 89. The method of claim 81further including the step of coupling a plurality of electroniccomponent to said lower wafer or wafer portion, each electroniccomponent being electrically or operatively coupled to at least part ofsaid microstructure.
 90. The method of claim 81 wherein at least one ofsaid upper wafer or wafer portion or said lower wafer or wafer portionincludes a silicon layer.
 91. The method of claim 81 wherein said lowerwafer or wafer portion includes an upper surface facing said upper waferor wafer portion after said coupling step, and wherein said solderablesurface is located on said upper surface.
 92. The method of claim 81further including the step of singulating said wafer stack into at leasttwo separate wafer stacks.
 93. The method of claim 92 wherein saidsingulating step includes singulating said wafer stack along twodividing lines, each of said dividing lines extending generallyperpendicular to said wafer stack, each dividing line including firstand second portion that are laterally spaced from each other.
 94. Themethod of claim 92 wherein said upper wafer or wafer portion defines acoverage area in to view, and wherein said singulating step includessingulating said wafer stack such that said solderable surface is notlocated inside said coverage area of the associated upper wafer or waferportion.
 95. The method of claim 81 wherein said upper wafer or waferportion includes an outer perimeter in top view, and wherein saidsolderable surface is located adjacent to said outer perimeter.
 96. Themethod of claim 81 wherein said coupling step including coupling saidupper wafer or wafer portion and said lower wafer or wafer portion by aphotopatternable adhesive.
 97. The method of claim 96 wherein saidphotopatternable adhesive is benzocyclobutene.
 98. The method of claim81 wherein said coupling step includes coupling said upper and lowerwafers together using a process entirely taking place at a temperatureof less than about 125° C.
 99. A microstructure system comprising: amicrostructure; at least one lead electrically coupled to saidmicrostructure; and a first portion of a photopatternable generallyelectrically insulating material at least partially covering said leadto at least partially electrically isolate said lead, wherein portionsof said microstructure are joined together by a second portion of aphotopatternable electrically insulating material.
 100. Themicrostructure system of claim 99 wherein said microstructure is asensor or an actuator.
 101. The microstructure system of claim 99wherein said lead is electrically connected to a component which cancause or sense movement of a movable portion of said microstructure.102. The microstructure system of claim 99 wherein said first and secondportions of said generally electrically insulating layer are the samematerial.
 103. The microstructure system of claim 99 wherein said firstand second portions of said generally electrically insulating layer arebenzocyclobutene.
 104. The microstructure system of claim 99 whereinsaid first and second portions of said generally electrically insulatinglayer are different materials.
 105. The microstructure system of claim99 wherein said microstructure is a micro mirror array.
 106. Themicrostructure system of claim 99 wherein said first and second portionsof said generally electrically insulating material are locatedimmediately adjacent to each other.
 107. A method for manufacturing amicrostructure comprising the steps of: providing a first microstructureportion and a second microstructure portion, at least one of said firstor second microstructure portions including at least one lead; forming afirst portion of a photopatternable generally electrically insulatinglayer at least partially over said lead to at least partiallyelectrically isolate said lead; and joining said first and secondportions of said microstructure together by a second portion of aphotopatternable electrically insulating layer.
 108. The method of claim107 wherein said lead is electrically coupled to a movable portion ofone of said first or second microstructure portions.
 109. Amicrostructure including: a first microstructure portion; and a secondmicrostructure portion, said first and second microstructure portionsbeing joined together by a photopatternable adhesive.
 110. Themicrostructure of claim 109 wherein said photopatternable adhesive isbenzocyclobutene.
 111. A method for manufacturing a microstructureincluding the steps of: providing a first wafer or wafer portion and asecond wafer or wafer portion; locating an adhesive on at least one ofsaid first and second wafers or wafer portions; patterning saidadhesive; joining said first and second wafer or wafer portions by saidadhesive to form a wafer stack; and machining or etching said waferstack to form at least one microstructure.
 112. The method of claim 111wherein said adhesive is benzocyclobutene.